摘要
介绍了国产ITO靶材磁控溅射制备ITO膜的工艺实验。实验结果表明,国产ITO靶材具有良好的工艺稳定性和重现性,在优选镀膜工艺参数条件下,获得了性能优良的ITO透明导电膜,并且在室温基片上也获得了满意的结果。
A description is given of the process and test of manufacturing of ITO film from domestic ITO material by magnetion sputtering. The results indicate that this target possesses good stability and reproducibility. ITO film with good electrical and optical properties has been prepared at selected parameters. Satisfactory ITO film can also form on substrate even at room temperature.
出处
《矿冶工程》
EI
CAS
CSCD
北大核心
1998年第3期61-63,共3页
Mining and Metallurgical Engineering
关键词
ITO靶
ITO膜
放电特性
氧分压
基片温度
ITO target, ITO film, Discharge characterization, O 2 partial pressure, Substrate temperature