摘要
磁控溅射技术在薄膜制备领域广泛应用,适合的工艺和制造技术对磁控溅射镀膜有着重要的影响。介绍了用于薄膜电路的生产工艺流程以及由此而决定的设备组成及控制技术,并重点叙述了薄膜制备的方法、参数选择、设备设计方法。
The technology of Vacuum Magnetron Sputtering Deposition is wide used on the field of thin film manufacture. Appropriate technics and manufacture technique have important influence to the quality of film. Flowchart of manufacturing film circuit and correlative equipment with its control technique are mainly mentioned in the article. And the article tries to solves some practical problem, such as the method, parameter and relevant equipment.
出处
《电子工业专用设备》
2009年第11期27-31,共5页
Equipment for Electronic Products Manufacturing
关键词
磁控溅射
镀膜工艺
设备
MS （Magnetron Sputtering）
Deposition technics
Deposition equipment
