摘要
化学气相沉积(CVD)方法是金刚石(膜)制备的主流技术,经过多年的发展,已从最初的微米金刚石膜发展到纳米金刚石膜,至目前高质量的单晶金刚石,应用领域不断扩展。除了工业和民用领域外,纳米金刚石膜在MEMS/NEMS、生物医学的应用进展引起业界关注,其中大尺寸单晶金刚石的制备是推动这些应用的关键。本文分析了MPCVD金刚石成膜特点,讨论了现阶段CVD金刚石膜商业化推广应用的制约因素,展望了今后金刚石膜的发展前景。
Chemical Vapor Deposition （CVD） is now the main way to prepare diamond （film）. After decades of development, from micro- to nano-crystalline diamond films and single crystal diamond with most outstanding properties, applications of diamond （film） continue to grow. Besides industrial and commercial applications, nano-crystalline diamond films in MEMS/NEMS and bio-medical applications draws people＇s attention. Preparation of large-size single-crystal diamond is the key to promote these applications. This paper analyses characteristics of Microwave Plasma CVD（MPCVD）, discusses the problems in com- mercialization of CVD diamond （film） application, outlooks the future of diamond film applications.
出处
《真空电子技术》
2009年第5期5-11,共7页
Vacuum Electronics
