摘要
Nitrogen-doped fluorinated diamond-like carbon(FN-DLC)films were prepared on single crystal silicon substrate by radio frequency plasma enhanced chemical vapor deposition(RF-PECVD)under different deposited conditions with CF4,CH4 and nitrogen as source gases.The influence of nitrogen content on the structure and electrical properties of the films was studied.The films were investigated in terms of surface morphology,microstructure,chemical composition and electrical properties.Atomic force microscopy(AFM)results revealed that the surface morphology of the films became smooth due to doping nitrogen.Fourier transform infrared absorption spectrometry(FTIR)results showed that amouts of C=N and C≡N bonds increased gradually with increasing nitrogen partial pressure r(r=p(N2)/p(N2+CF4+CH4)).Gaussian fit results of C 1s and N 1s in X-ray photoelectron spectra (XPS)showed that the incorporation of nitrogen presented mainly in the forms ofβ-C3N4 and a-CNx(x=1,2,3)in the films.The current-voltage(I-V)measurement results showed that the electrical conductivity of the films increased with increasing nitrogen content.
Nitrogen-doped fluorinated diamond-like carbon (FN-DLC) films were prepared on single crystal silicon substrate by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) under different deposited conditions with CF4, CH4 and nitrogen as source gases. The influence of nitrogen content on the structure and electrical properties of the films was studied. The films were investigated in terms of surface morphology, microstructure, chemical composition and electrical properties. Atomic force microscopy (AFM) results revealed that the surface morphology of the films became smooth due to doping nitrogen. Fourier transform infrared absorption spectrometry (FTIR) results showed that amouts of C=N and C≡N bonds increased gradually with increasing nitrogen partial pressure r (r=p(N2)/p(N2+CF4+CH4)). Gaussian fit results of C 1 s and N 1 s in X-ray photoelectron spectra (XPS) showed that the incorporation of nitrogen presented mainly in the forms of β-C3N4 and α-CNx (x=1, 2, 3) in the films. The current--voltage (I--V) measurement results showed that the electrical conductivity of the films increased with increasing nitrogen content.
出处
《中国有色金属学会会刊:英文版》
EI
CSCD
2009年第6期1551-1555,共5页
Transactions of Nonferrous Metals Society of China
基金
Project(70121)supported by the Postdoctoral Science Foundation of Central South University,China
Project(200807MS044)supported by Scientific Research Fund of Education Department of Guangxi Autonomous Region,China
Project(0710908-06-K)supported by theResearch Funds of Guangxi Key laboratory of Information Materials