摘要
磁场退火对直流溅射沉积得到的FeAg薄膜结构和磁性具有显著的影响。X射线衍射和磁滞回线测量的结果表明,随着磁退火温度和磁场强度的升高,颗粒生长,平行膜面和垂直膜面矫顽力增加,在400℃退火时达到最大值,并且垂直薄膜表面方向的矫顽力大于平行薄膜表面方向的矫顽力,FeAg薄膜在磁场下经过此温度退火表现为垂直磁各向异性。继续升高退火温度矫顽力则有减小的趋势。
The effect of magnetic annealing on structure and magnetic properties of FeAg films prepared by DC magnetron sputtering was investigated. X-ray diffraction and vibrating sample magnetometer (VSM) results suggest that the structure and magnetic properties of FeAg films are associated with annealing temperature and intensity of magnetic field applied during annealing. Hc∥ and Hc⊥ first increase with increasing annealing temperture, reach the maximal value at 400℃, and then decrease with annealing temperature increasing. The value of Hc∥ is slightly lower than that of Hc⊥ at 400℃, indicating that FeAg films annealed at 400 ℃ in magnetic field possess magnetic anisotropy.
出处
《兵器材料科学与工程》
CAS
CSCD
2009年第6期10-13,共4页
Ordnance Material Science and Engineering
基金
教育部科技研究重点项目(批准号:208178)
吉林省教育厅项目(批准号:2006-72)
关键词
Fe-Ag薄膜
磁控溅射
磁退火
矫顽力
FeAg thin film
magnetron sputtering
magnetic annealing
coercive force