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柔性ITO衬底上铜酞菁薄膜有序生长的X射线衍射研究 被引量：2

X-ray diffraction investigations of well-ordered copper phthalocyanine films deposited on flexible ITO substrate
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摘要 采用石英晶体微天平实时监测薄膜生长速率,通过控制衬底温度与薄膜生长速率,在柔性ITO导电衬底上真空蒸发沉积了铜酞菁薄膜。X射线衍射分析表明,适当提高衬底温度与薄膜生长速率,可促进薄膜的有序生长。当衬底温度为90℃,生长速率为10nm/min时,薄膜的有序度最高,薄膜晶型呈(相和(200)晶面。 Through controlling substrate temperature and growth rate detected by quartz crystal microbalance measurement,CuPc films were deposited on flexible ITO substrate.X-ray diffraction investigation shown that the growth of CuPc films were strongly affected by substrate temperature and growth rate.Well-ordered CuPc film could be deposited at substrate temperature 90℃ and growth rate 10nm/min.Crystal structure of the as-prepared CuPc film was existed as（phase and（200） plane.
作者 梁氏秋水 陈振兴 朱宏伟 盛勇 胡豫
机构地区 中山大学化学与化学工程学院
出处 《化工新型材料》 CAS CSCD 北大核心 2009年第11期40-42,共3页 New Chemical Materials
基金 国家自然科学基金资助项目(20876182 20576141) 广东省自然科学基金资助项目(7003705)
关键词 铜酞菁 X射线衍射 柔性衬底 真空蒸发沉积 有序薄膜 copper phthalocyanine X-ray diffraction flexible substrate vacuum evaporation deposition well-ordered film
分类号 TN304.054 [电子电信—物理电子学]
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参考文献11

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同被引文献26

  • 1何智兵,韩高荣,吴卫东,唐永建.真空热蒸发酞菁铜(CuPc)薄膜的结构及光学、电学性能研究[J].真空科学与技术学报,2005,25(4):278-282. 被引量：12
  • 2NENON S, KANEHIRA D, YOSHIMOTO N, et al. Am- bipolar organic field -effect transistors based on CuPc and FI6CuI: hnpac/ of Ihe fine microstructure at or- ganic- organic interface[ J]. Synlh Met,2011,161 ( 17/ 18) :1 915-1 920.
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  • 6YOOK K S,CHIN B D,LEE J Y,et al. Vertical orienta- tion of copper phthaloeyanine in organic solar cells using a small molecular weight organic /emplating layer [ J ]. Appl Phys l,ett,2011,99(4) :43 308.
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  • 9RUI)IONO, KANEKO F, TAKEUCHI M. Morphological characteristics of peQ'lene - doped phthalocyanine thin films and their photovoltaic effec [ J ]. Appl Surf Sci, 1999,142 :598-602.
  • 10MA Guo-hong, GUO Li-jun, MI Jun, et al. Femtosecondnonlinear optical response of metallophthalocyanine films [ J]. Solid State Communication, 2001,118 ( 12 ) : 633- 638.

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化工新型材料
2009年 第11期

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