2 维光子晶体抗反膜的制作及其特性分析

Fabrication and characteristic analysis of anti-reflective film of 2-D photonic crystal

为了研究2维亚波长光栅的抗反射特性,分析了2维光子晶体的2维光栅结构,通过全息3束光干涉的方法,在光刻胶上制作了六角结构的2维全息光子晶体结构。把具有2维全息光子晶体结构的光刻胶作为母版采用全息模压的方法,将结构复制到薄膜材料上。结果表明,这种抗反膜在红外波段具有增透作用,与理论分析相吻合。

In order to study the anti-reflection property of two-dimension sub-wavelength gratings, the structure of two-dimension grating of two-dimension photonic crystal was analyzed in detail. The two-dimension hexagonal structure photonic crystal was fabricated with three coherent beams incident onto the recording medium （photoresist） with holographic recording method. Taking the recording medium with relief structures as the master and using embossing technology, the structures can be replicated to polyvinylchlorid film. The measured result shows that the transmittance of the thin film at infrared wave band is enhanced, in good agreement with the theoretical result.