在线常压化学气相沉积方法制备TiO_2自洁薄膜玻璃(英文)

Preparation of self-cleaning glass coated with TiO_2 on a float glass line by APCVD method

利用常压化学气相沉积技术,在浮法玻璃线上制备了TiO2自洁薄膜玻璃。研究了水和氧气对薄膜沉积速率的影响,结果表明水和氧气的加入增加了薄膜的沉积速率。分别用原子力显微镜和X-射线衍射分析仪研究了薄膜的表面形貌和晶型结构,薄膜表面的平均粗糙度为84 nm,其晶型由锐钛矿和金红石组成。同时还研究了自洁玻璃的光催化活性和亲水性,随着紫外光照时间的增加,薄膜的光催化活性增加且对水的接触角由光照前的54°降到光照后的6°。

The self-cleaning glass coated with TiO2 was prepared on a float glass line using on-line deposition technology, in which the titanium dioxide thin films was prepared using the on-line atmospheric pressure chemical vapor deposition （APCVD） method. The introduction of additional water vapor and the oxygen flow could increase the deposition rate to some extent. The studies on the film with atomic force microscope （AFM） and X-ray diffractometer （XRD） showed the surface roughness in about 84 nm and the crystalline structures of anatase and rutile in TiO2 thin film. The photocatalytic and hydrophilic characters of self-cleaning glass were tested using degradation efficiency and the water contact angle. It showed that the degradation efficiency of self-cleaning glass was increased with irradiation time expanded and the water contact angle was decreased rapidly from 54 to 6 degree after irradiated by UV light.