摘要
光固化有机硅不仅具有有机硅的耐温、耐候、电气绝缘、低表面张力和低表面能等优良性能．而且还具有可室温固化、固化速度快、无污染等紫外光固化材料的特性，所以备受人们关注，并有着广泛应用领域。
Anovel photosensitive polysiloxane urethane acrylate(PSUA) was synthesized from isophorone diisocyanate(IPDI) ,alkylhydroxyl-terminated polydimethysiloxane(SD9134) and hydroxyethyl acrylate(HEA) .The influences of amount of raw materials, dosage of catalyst and temperature on the reaction were investigated.The results showed that the optimal reaction conditions were as follows:taking IPDI and SD9134 as main feedstock with 0.05%～0.1% of DBTDL as catalyst.The reaction temperature should be kept between 20℃ and 40℃ at the former three steps and below 70℃ at the last step.The structure of PSUA was characterized by IR and GPC.
出处
《精细与专用化学品》
CAS
2009年第23期26-29,共4页
Fine and Specialty Chemicals
基金
国家自然基金(50873011)
