表面微观形貌测量及其参数评定的发展趋势

Measurement and characterization tendency of the surface microtopography

由于表面加工质量的不断提高，对微观形貌测量技术提出了更高的要求。传统触针式轮廓仪测量具有稳定、可靠、测量动态范围大等优点，但会划伤被测表面；而非接触式形貌测量技术克服了接触式测量易划伤表面的缺点，它主要包括光学散射法、各种光探针法、光学显微干涉法以及采用ＳＥＭ、ＳＴＭ、光子隧道显微镜和原子力显微镜（ＡＦＭ）来探测表面微观形貌的方法。各种测量方法均有其优点和局限性。光学测量方法由于受衍射限制，使其横向分辨率很难提高，在测量大斜率及台阶表面时，测量误差很大。而ＡＦＭ被公认为是一种理想的表面微观形貌测量方法。此外，在表面微观形貌评定方面，国际上正积极探索各种三维评定参数以取代原来的二维参数。

Ever improving process quality of surfaces demands high level techniques of microtopography. Traditional contact profilers feature excellent measuring stability, reliability and wide dynamic range, but they may damage the measured surfaces. No contact measuring technique overcomes the drawback existing in contact profilers. It mainly includes optical diffusion technique, verious optical probe techniques, optical interferometrical microscopes, SEM, STM, photon tunneling microscope and AFM, etc. Each method his its own merit and limitation. Owing to the diffraction effect, its difficult to improve the lateral resolution of all optical methods. When measuring surface with large slopes and step heighs, optical methods will cause great error. AFM is regarded as an ideal method for surface microtopography measurement. Furthermore, to characterize surface microtopography, 3D parameters are being developed in order to substitude the previous 2D paramenters in the future.