热丝化学气相沉积法生长金刚石薄膜的动态模型

THE THERMODYNAMIC MODEL OF DIAMOND FILM GROWTH IN HOT FILAMENT CHEMICAL VAPOR DEPOSITION

在用热丝化学气相沉积法生长金刚石薄膜的过程中，具有活性的原子及原子团的输运是一个复杂的动态过程．对此过程提出了一个理论模型，着重研究衬底附近的活化气体原子团的比例随各参数的变化及其对金刚石生长的影响，从而求得在一定的参数空间内理想的金刚石生长区域，以指导金刚石外延的实践．

It is a complicated dynamic process that the activated hydrocarbon species are transmitted during the diamond film growing in hot filament chemical vapor deposition (HFCVD). A thermodynamic model about this process were proposed, in which the ratios of gas compositions near the substrate′s surface, the ratios′ variety with the changes of parameters, and the influence of the ratios′ variety to the substrate′s surface reactions were studied. In accordance with the corresponding calculations of thermodynamics, the parameters′ area of idea diamond film growth in HFCVD has been pointed out in this thesis, in order to improve diamond epitaxial method.