磁头承载面结构层深度对气膜润滑性能的影响

The Gas Film Lubrication Characteristic Analysis with the Variation of Magnetic Head Bearing Surface Recess

采用理论分析和数值模拟相结合的方法分析了磁头承载面结构层深度变化对气膜性能的影响。结果表明:磁头的基层和次景层深度变化对气膜的正负压承载区域的压力分布产生明显的影响。其中次景层深度的变化主要对正压产生影响,随着次景层深度的不断增加,产生正压的滑块区域压力都明显下降,特别是磁头尾端滑块处的气膜压力变化最大;而基层深度的变化对正压和负压分布都产生影响,随着基层深度变化产生正压的滑块区域压力变化较大,表现更为明显。由于磁头结构层深度变化对正、负压力分布和总气浮力的作用,从而影响气膜承载力性能。在实际磁头结构设计中可以通过优化设计确定最佳各结构层深度,达到增加磁存储容量的目的。

The gas film lubrication performance was investigated using theoretical analysis and numerical calculation. The results show that the variations of main recess and shallow recess of bearing surface have obvious influence on the posi- tive and negative pressure distribution. The effect of shallow recess is major on the positive gas film pressure, and the posi- tive gas film pressure obviously decreases with the increase of shallow recess, especially at the rear of slip slider. The main recess has effect on both positive and negative pressure distributions. However, the variation of positive pressure created on the slider with main recess is more obvious than that of negative pressure. Due to the variation of gas film pressure distribu- tion, the gas loading capacity is induced to change. In order to increase storage capacity, the optimal depth may be obtained by the optimal design method in the actual design of magnetic head.