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宽波长太阳能电池抗反射层结构设计 被引量:9

Design of a broadband anti-reflection coating for solar cells
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摘要 为了降低太阳能电池表面对入射光的反射,提高其光电转换效率,设计了入射光谱在400~1100nm宽波长范围内的二维亚微米抗反射层结构。该结构主要由高折射率ZnS膜层、低折射率MgF2膜层及二维亚微米光栅层等组成。采用严格耦合波分析理论计算了此结构的反射特性,当ZnS膜层、MgF2膜层、光栅深度及光栅周期分别为50nm、150nm、200nm及400nm,入射角在0~80°变化时,其平均反射率为7.76%。计算结果表明:所设计的抗反射层结构可有效降低太阳能电池表面对入射光的反射,从而提高其光电转换效率。 Reflection of incident light from the surface of solar cells is one of the major mechanisms seriously affecting the photovoltaic transform efficiency of the solar cells. To reduce the reflection, a two dimensional submicron anti-reflection coating with the incident wavelength from 400 nm to 1 100 nm was designed.The designed structure was mainly composed of a ZnS film, an MgF2 film and a two dimensional submicron grating. The reflection efficiency of the structure was calculated by the rigorous coupled wave analysis theory. The average reflection efficiency of the designed anti-reflection coating was 7.76% when the incident angle varied from 0° to 80° with the height of the ZnS film, the MgF2 film, the depth and the pitch of the grating of 50 nm, 150 nm, 200 nm and 400 nm respectively. Results show that the designed anti-reflection coating can effectively reduce the reflection from the Si surface to improve the photovoltaic transform efficiency of the solar ceils.
出处 《红外与激光工程》 EI CSCD 北大核心 2009年第6期999-1002,共4页 Infrared and Laser Engineering
基金 江苏省自然科学基金资助项目(BK2009601) 江苏省高校自然科学研究资助项目(09KJD120002)
关键词 光栅 抗反射层 严格耦合波分析 太阳能电池 Grating Anti-reflection coating Rigorous coupled-wave analysis (RCWA) Solar cells
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  • 1张培茗,陈家璧,李筠,庄松林.波导多层存储中调焦方法的研究[J].仪器仪表学报,2005,26(z1):117-118. 被引量:1
  • 2董祥美,陈家璧,梁忠诚,庄松林.波导多层光存储读出光学系统的实验研究[J].仪器仪表学报,2005,26(z1):119-120. 被引量:2
  • 3张锦,冯伯儒,杜春雷,王永茹,周礼书,侯德胜,林大键.反应离子刻蚀工艺因素研究[J].光电工程,1997,24(S1):47-52. 被引量:22
  • 4柴志方,刘德安,戴翠霞,栾竹,刘立人.Ce:Mn:LiNbO_3晶体紫外记录研究[J].中国激光,2005,32(8):1132-1136. 被引量:4
  • 5Sankur H, Southwell W H. Broadband Gradient - Index Antireflection Coating for ZnSe[ J]. Appl. Opt., 1984,23(16) :2770 - 2773.
  • 6Clapham P B, Hutley and M C. Reduction of Lens Reflexion by the Moth Eye Principle[J].Nature, 1973,244:281 - 282.
  • 7Grann E B, Moharam M G, Pommet D A. Optical design for antireflective tapered two - dimensional subwavelength gratings structures[J].J. Opt. Soc. Am.A, 1995,12(2):333-339.
  • 8Raguin D H, Morris G M. Subwavelength Structured Surfaces and their applications[C]. Pro. SPIE, 1993,173(36) :87 - 96.
  • 9R. Petit. Electromagnetic theory of gratings [ M ]. Berlin : Springfer - Verlag Berlin Heidelberg New York, 1980,258 - 275.
  • 10Raguin D H, Morris G M. Antireflection structured surfaces for the infrared spectral region[ J]. Appl. Opt, 1993,32(7 ) : 1154 - 1167.

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  • 1杨文华,吴鼎祥,李红波.空间高效硅太阳电池减反射膜设计与数值分析[J].Journal of Semiconductors,2004,25(9):1118-1122. 被引量:16
  • 2顾培夫,郑臻荣,赵永江,刘旭.TiO_2和SiO_2薄膜应力的产生机理及实验探索[J].物理学报,2006,55(12):6459-6463. 被引量:30
  • 3WU M-H,PAUL K E,YANG J,et al.Fabrication of frequencyselective surfaces using microlens projection photolithography[J].Applied Physics Letters,2002,80(19):3500-3502.
  • 4刘明,谢常青.徽细加工技术.北京:化学工业出版社,2004:11-12.
  • 5H P赫尔齐克.微光学元件系统和应用.北京:国防工业出版社,2002:156-158.
  • 6WU Hong-kai,ODOM T W,WHITESIDES G M.Generation of crome masks micrometer-scale features using microlens lithrography[J].Advanced Mate,2002,14(17):1213-1216.
  • 7WU M-H,WHITESIDES G M.Fabrication of arrays of twodimensional micropattems using microspbercsas lenses for projection photolithography[J].Applied Physics Letters,2001,78(16):2273-2275.
  • 8WU Hong-kai,ODOM T W,WHITESIDES G M.Reduction photolithography using microlens arrays:applications in gray scale photolithography[J].Analytical Chemistry,2002,74(14):3267-3273.
  • 9WU M-H,PAUL K E,WHITESIDES G M.Patterning flood illumination with microlens arrays[J].Appled Optics,2002,41(13):2575-2585.
  • 10SMITH W J.Modern Optical Engineering[M].New York:McGrow-hill Companies Inc,2000:347-385.

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