光亮Fe-Ni合金电沉积工艺的研究

A STUDY OF ELECTRODEPOSITION OF BRIGHT AND SHINY Fe-Ni ALLOY

介绍了一种新的电沉积光亮Ｆｅ－Ｎｉ合金的方法用这种方法在室温下电沉积出外观接近镜面的Ｆｅ－Ｎｉ合金镀层，其厚度可达３７μｍ经Ｘ－ｒａｙ衍射及等离子光谱分析证实，所获得的合金镀层为γ（Ｆｅ－Ｎｉ）合金相，镀层中含Ｆｅ和Ｎｉ的量分别为２３．５％～４５．７％和７６．２％～５３．８％，同时含有少量的Ｐ和Ｂ元素文中对电沉积的工艺条件、光亮剂ＨＢ、添加剂ＨＴ的作用和影响进行了分析和探讨图６，表２。

A new method has been developed for electrodeposition of bright and shiny Fe-Ni alloys at room-temperature. The surface of Fe-Ni alloys electrodeposited were approximate to that of mirror and the thickness of the alloys were to 37μm. The composition and crystal structure of the plated Fe-Ni alloys were examined respectively by Inductively Couple Plasma Atomic Emission Spectrometry(ICP-AES) and X-ray diffraction, results showed that the Fe-Ni alloys are γ(Fe-Ni) alloys and contain 23.8%～46.2%Fe,76.2%～53.8%Ni and a little other elements such as P, B . In addition, effects of operating parameters,brightener HB and additives HT on thickness and bright level of the plated Ni-Fe alloys have been studied in detail.6figs.,2tabs.,9refs.