银含量对射频磁控溅射法制备Ag-TiO_2薄膜能隙和相结构的影响(英文)

EFFECT OF SILVER CONTENT ON ENERGY GAP AND PHASE STRUCTURE OF SILVER–TITANIA THIN FILMS PREPARED BY RADIO FREQUENCY MAGNETRON SPUTTERING

采取射频磁控溅射法在硅和石英衬底上淀积Ag–TiO2纳米薄膜,利用X射线衍射仪和紫外可见分光计分析薄膜的相结构和光学性能,研究银含量对Ag–TiO2薄膜相结构和能隙的影响。结果表明:银含量影响Ag–TiO2薄膜的相结构,薄膜中的银为金属Ag(Ag0),随着银含量(0～40%,体积分数)的增加,薄膜的能隙先减后增,但是仍然小于纯TiO2薄膜的能隙,银的添加明显地改善了TiO2薄膜对可见光的吸收。

Silver–titania （Ag–TiO2） nanostructured thin films were deposited on silicon and quartz substrates by radio frequency magnetron sputtering. The phase structure and the optical properties of the films were characterized by X-ray diffractometer and ultraviolet-visible spectrometer. The effect of Ag content on the phase structure and the energy gap （Eg） of the films were investigated. The results show that Ag content affects the phase structure of Ag–TiO2 thin films, and Ag in the films is metallic Ag （Ag0）. The Eg of the films decreases first and then increases to the values smaller than that of the pure TiO2 thin films when Ag content increases from 0 to 40% in volume. The addition of silver in the TiO2 thin films can improve the visible light absorption.