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Micro-analysis of high-temperature oxidation-resistance of a new kind of heat-resistant grid plate in grate-kiln 被引量:2

Micro-analysis of high-temperature oxidation-resistance of a new kind of heat-resistant grid plate in grate-kiln
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摘要 To further improve the oxidation-resistance of materials and reduce the cost of grid plates in grate-kiln, a new kind of heat-resistant grid plate was developed. The microstructure of this grid plate with a life more than 18 months was studied by XRD, SEM and EDS techniques. The results show that high hardness, high intensity and good impact property make the new kind of heat-resistant grid plate and its oxide film have a higher resistance to deformation and abrasion at 900-1000℃ Besides, small grain size is beneficial to form a complete protective oxide film. The oxide film composed of SiO2 layer, Cr2O3 layer and Fe2O3 layer is rather thin and bonds closely with the backing. The forming of the chemical stable nickel-rich layer increases the density of Cr2O3 layer. To further improve the oxidation-resistance of materials and reduce the cost of grid plates in grate-kiln, a new kind of heat-resistant grid plate was developed. The microstructure of this grid plate with a life more than 18 months was studied by XRD, SEM and EDS techniques. The results show that high hardness, high intensity and good impact property make the new kind of heat-resistant grid plate and its oxide film have a higher resistance to deformation and abrasion at 900-1000℃ Besides, small grain size is beneficial to form a complete protective oxide film. The oxide film composed of SiO2 layer, Cr2O3 layer and Fe2O3 layer is rather thin and bonds closely with the backing. The forming of the chemical stable nickel-rich layer increases the density of Cr2O3 layer.
出处 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2009年第6期632-639,共8页 矿物冶金与材料学报(英文版)
关键词 grate-kiln process grid plate heat resistance high-temperature oxidation-resistance oxide film grate-kiln process grid plate heat resistance high-temperature oxidation-resistance oxide film
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