摘要
With Shockley＇s approximate-channel theory and TCAD tools, a high-voltage, ultra-shallow junction PJFET for the input stage of an integrated operational amplifier （OPA） was realized. The high-performance PJFET device was developed in the Bi-FET process technology. The measured specifications are as follows. The top-gate junction depth is about 0.1 μm, the gate-leakage current is less than 5 pA, the breakdown voltage is more than 80 V, and the pinch-off voltage is optional between 0.8 and 2.0 V. The device and its Bi-FET process technology were used to design and process a high input-impedance integrated OPA. The measured results show that the OPA has a bias current of less than 50 pA, voltage noise of less than 50 nV/Hz^1/2, and current noise of less than 0.05 pA/Hz^1/2.
With Shockley＇s approximate-channel theory and TCAD tools, a high-voltage, ultra-shallow junction PJFET for the input stage of an integrated operational amplifier （OPA） was realized. The high-performance PJFET device was developed in the Bi-FET process technology. The measured specifications are as follows. The top-gate junction depth is about 0.1 μm, the gate-leakage current is less than 5 pA, the breakdown voltage is more than 80 V, and the pinch-off voltage is optional between 0.8 and 2.0 V. The device and its Bi-FET process technology were used to design and process a high input-impedance integrated OPA. The measured results show that the OPA has a bias current of less than 50 pA, voltage noise of less than 50 nV/Hz^1/2, and current noise of less than 0.05 pA/Hz^1/2.
基金
supported by the Innovative Fund of the China Electronics Technology Group Corporation(CETC)(No.GJ0708020).
