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First-principles study of diffusion behaviour of point defects in the O-terminated (0001) surface in wurtzite ZnO

First-principles study of diffusion behaviour of point defects in the O-terminated (0001) surface in wurtzite ZnO
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摘要 A detailed first-principles study of the diffusion behaviour of point defects in the O-terminated (0001) surface in wnrtzite ZnO was performed. The 0 vacancy and interstitial are found to diffuse much more easily in surface than in bulk. The Zn vacancy has a similar migration barrier for both bulk and surface, but has much smaller barrier for the diffuse-in process. The Zn interstitial is difficult to diffuse in the surface directly, but it can diffuse into the bulk relatively easily. Specific values of corresponding migration barriers are obtained. A detailed first-principles study of the diffusion behaviour of point defects in the O-terminated (0001) surface in wnrtzite ZnO was performed. The 0 vacancy and interstitial are found to diffuse much more easily in surface than in bulk. The Zn vacancy has a similar migration barrier for both bulk and surface, but has much smaller barrier for the diffuse-in process. The Zn interstitial is difficult to diffuse in the surface directly, but it can diffuse into the bulk relatively easily. Specific values of corresponding migration barriers are obtained.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第1期257-261,共5页 中国物理B(英文版)
基金 Project supported by "973 Project" of Ministry of Science and Technology of China (Grant No. 2006CB605102)
关键词 SEMICONDUCTOR surface diffusion first-principles calculation semiconductor, surface diffusion, first-principles calculation
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