逐级降电压法交流电沉积Pd-Ni纳米线的研究

Study of AC Electro-deposition of Pd-Ni Nanowires by Stepping Down Oxidation Voltage

在传统的二次阳极氧化法制备多孔氧化铝模板的基础上,利用逐级降低电压的方法减薄阻挡层,用扫描电子显微镜、透射电子显微镜和X射线光电子能谱仪对Pd-Ni合金纳米线的组织形貌、晶体结构和化学状态等进行了表征与测试,结果表明,Pd-Ni纳米线的直径为70nm左右,且纳米线径向表面不够光滑,呈毛刺状,单根纳米线属于多晶结构;Pd-Ni纳米线中Pd：Ni原子比接近为1：1,表明金属Pd、Ni在纳米线中处于简单混合状态。此外,对交流电沉积制备金属纳米线时沉积条件的选择做了简要解析。

On the base of porous alumina template being prepared by traditional two anodic oxidation steps, the thickness of harrier layer slowly became thinner with the decrease of the anodic oxidation voltage step by step, to be propitious to AC electro-deposition of Pd-Ni alloy nanowires. Scanning electron microscopy （SEM）, transmission electron microscopy （TEM） and X-Ray photoelectron spectrometer （XPS） were employed to investigate the morphology, crystal structure and chemical state of palladium-nickel nanowires. The results indicated that the diameter of Pd-Ni nanowire was about 70 nm, it was not smooth and coarse on the surface,and nanowire was multi-crystal structure. Atomic ratio of palladium and nickel in nanowire was approximately 1：1. This indicated that palladium and nickel were simply mixed in nanowires. In addition, the electro-deposition conditions of preparation Pd-Ni nanowires were also briefly analyzed.