期刊文献+

基于形态滤波和分水岭算法的硅片缺陷提取 被引量:1

Silicon Defect Extraction Based on Morphological Filter and Watershed Algorithm
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摘要 针对硅片表面缺陷的特点,对其缺陷的提取技术进行了研究,采用了多结构元素的广义形态闭-开和形态开-闭滤波器,结合改进分水岭算法进行缺陷提取.滤波器对输入图像及滤波后图像的梯度图像进行平滑,实现消除噪声、简化图像、保持细节的作用.为了克服分水岭的过度分割问题,提出了改进的分水岭算法,利用区域强度准则和边界强度准则对过分割区域进行合并,很好的解决了过分割问题.实验表明,该方法可以提取精确且封闭的缺陷边缘轮廓,为进一步的缺陷特征量的提取与选择奠定了基础. Defect extraction techniques are studied regarding the silicon surface defect, generalized close-opening and open-closing filter based on the morphological filter with the different size structuring element, and improved watershed is used. The filter is introduced to eliminate the noise and simplify the image and morphological gradient image while pre- serving the details. In order to reduce the over-segmentation of the watershed algorithm, suggests an improved watershed, region average gray value and edge strength criterion is used in merging operation and has a good effect on segmentation. The experiments show that this method can provide accurately localized and closed region contours, which lays a good foundation for defect feature extraction and selection.
出处 《河北工业大学学报》 CAS 北大核心 2009年第6期44-48,共5页 Journal of Hebei University of Technology
关键词 图像处理 缺陷检测 形态滤波 分水岭 过分割 image processing defects detection morphological filter watershed over-segmentation
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参考文献6

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