离子溅射能量损失及射程的模拟研究

THE SIMULATION RESEARCH ON ENERGY LOSS AND RANGE OF SPUTTERING IONS

运用SRIM2006软件对靶材的溅射进行了模拟,计算了各种情况下离子入射靶材能量损失和射程分布,分析其内部碰撞机理,得到了入射离子能量损失和射程分布随离子能量得变化规律:低能离子溅射能量损失以核阻止为主,高能离子溅射能量损失以电子阻止为主;载能离子的能量损失及射程与入射离子和靶原子有关;对于低能离子溅射靶材,入射离子主要分布在靶材表面几层原子内。

The sputtering process for targets was simulated using SRIM2006 software,ion energy loss and range of the target distribution were calculated under a variety of circumstances,by analysising the internal mechanism of collision,energy loss of incident ions with the ion range distribution and energy changed,the general rules as following： The nuclear stopping power gives priority to the energy loss of low energy ion sputtering,the electronic stopping power gives priority to the energy loss of high-energy ion sputtering;ion energy loss and range are related to the incident ions and atoms of the target;for low energy ion sputtering,the incident ions are mainly distributed in the surface layers of atoms within the target.