电沉积Ni-P、Ni-P-Si_3N_4非晶态合金及其结构、性能研究

Preparation Technology,Structures and Properties of Ni-P、Ni-P-Si_3N_4 Amorphous Electrodeposits

研究了Ni－P、Ni－P－Si3N4非晶态合金薄膜的电沉积工艺，通过SEM－EDS，XRD，EMPA等微观分析方法，提出了获取8～14wt%Ni-P和Ni-PSi3N4．非晶合金镀层的镀液组成和电沉积参数．实验表明，Ni－P非晶态合金镀层在碱液中具有优越的耐蚀性能，在含Cl－1的中性盐溶液中有良好的耐蚀性，且不产生点蚀；Ni－P－Si3N4非晶合金镀层，经晶化处理后，耐蚀性能提高，且与基材呈冶金结合。

Preparation technology of Ni-P.Ni-P-Si3N4 amorphous alloys by using electrodeposition methods was studied. Optimum composition of plating solution and parameters of electro-deposition have been obtained, which are used to produce the Ni-P and Ni-P-Si3N4 amorphous alloy film containing 8~ 14wt%p.These results indicate that Ni-P amorphous alloy films have excellent resistance to corrosion in alkaline solution and neuter salt solution containing Cl-1, and no pitting corrosion happen ;and Ni-P-Si3N4 alloy films have optimum wear resistance in crystal state, and which also has favor metallurgy bonds.