真空蒸发CVD法研制超微粒SnO_2薄膜

Perparation of Ultra-fineness Particle SnO_2 Film by Vaccum Evaporation

用真空反应蒸发,在玻璃、陶瓷及Si-SiO_2衬底上获得晶粒线度为90至0.2μm的超微粒SnO_2薄膜,对薄膜的结构、形貌及其电学性质和光学性质进行了研究。通过控制掺杂,使薄膜具有优良的湿敏特性和气敏特性。

The ultra-fineness particle SnO_2 films with a grain size from 90 angstrom to 0.2 micron have been deposited by vacuum-reactive evapoation on the substrate of glass, ceramics and Si-SiO_2. The thickness of films is 10~2～10~4 angstrom. The structure, electrical and optical properties have been investigated respectively. The SnO_2 films, proper doped with impurity, are in possession of excellent sensing characteristics to humidity and gasses.