溅射工作气压对Fe/Si_3N_4多层膜微波磁性的影响

Influence of Sputtering Pressure on Permeability of FeSi_3N_4 Multilayered Films

在不同的溅射气压下,采用连续磁控溅射制备了Fe/Si3N4多层膜,探讨了溅射气压对多层膜微波磁性的影响。研究发现,溅射气压影响着多层膜的沉积速率和微结构,在溅射铁子层时,Ar气流量控制在300sccm^400sccm下,在溅射氮化硅子层时,氩气与氮气的流量控制在2∶1,总流量控制在320sccm时制备得到的多层膜具有最好的磁性能。

The Fe/Si3N4 multilayered films were grown by magnetron sputtering on organic polymer substrates. The impacts of the film growth conditions,including the sputtering pressure,sputtering power deposition rate,and ratio of argon/nitrogen,on quality of the film were studied. The mierostructures and magnetic properties of the Fe/Si3N4 muhilayered films were characterized with Vector network analyzer and scanning electron microscopy （SEM）. The results show that the sputtering pressure strongly affects the deposition rate and mierostruetures of the Fe/Si3N4 multilayered films. The highest permeability was obtained under the following conditions：at an argon flow rate of 300sccm -400sccm in depositing Fe layers;at an argon/nitrogen ratio of 2：1 and a total flow rate of 320sccm in the Si3N4 layers growth.Possible mechanisms were also briefly discussed.