期刊文献+

纤锌矿AlN/GaN/InN/GaN/AlN量子阱的界面和局域光学声子 被引量:7

Interface and Confined Optical-phonon Modes in Wurtzite AlN/GaN/InN/GaN/AlN Quantum Wells
下载PDF
导出
摘要 基于介电连续模型和Loudon单轴模型,采用转移矩阵法讨论纤锌矿AlN/GaN/InN/GaN/AlN量子阱的界面和局域光学声子模.结果表明在GaN阱区引入InN纳米凹槽使纤锌矿AlN/GaN/AlN量子阱的光学声子发生较大变化.对给定波矢,在不同的频率范围内,存在两种界面光学声子模和两种局域光学声子模.声子色散关系和静电势分布表现出较AlN/GaN/AlN单量子阱更为复杂的形态. Based on the dielectric continuum model and Loudon's single-axis model,the transfer matrix method is adopted to investigate interface and confined optical-phonon modes in wurtzite AlN/GaN/InN/GaN/AlN quantum wells. The results show that the introduction of an InN nanogroove in the center of a quantum well changes optical phonon modes of the system. For a given wave vector of phonons,there are two kinds of interface optical phonons and two kinds of confined optical phonons existing in certain frequency regions. The dispersion relation and electrostatic potential of phonon modes are more complicated than that in a single AlN/GaN/AlN quantum well.
作者 屈媛 班士良
出处 《内蒙古大学学报(自然科学版)》 CAS CSCD 北大核心 2010年第1期57-65,共9页 Journal of Inner Mongolia University:Natural Science Edition
基金 高等学校博士学科点专项科研基金资助项目(20070126001) 内蒙古自治区自然科学基金重点资助项目(20080404Zd02)
关键词 纤锌矿 量子阱 纳米凹槽 光学声子模 wurtzite quantum well nanogroove optical phonon mode
  • 相关文献

参考文献23

  • 1Shen B,Someya T,Arakawa Y. Influence of strain relaxation of the AlxGa1-xN barrier on transport properties of the two-dimensional electron gas in modulation-doped AlxGa1-xN/GaN heterostructures [J]. Appl. Phys. Lett. , 2000,76: 2 746-2 748.
  • 2Hu W D,Chen X S,Quan Z J,et al. Simulation and optimization of GaN-based metal-oxide-semiconductor high- electron-mobility-transistor using field-dependent drift velocity model [J].J. Appl. Phys., 2007, 102 (11): 034502-1-034502-7.
  • 3Davydov V Y, Klochikhin A A,Seisyan R P, et al. Absorption and Emission of Hexagonal InN. Evidence of Narrow Fundamental Band Gap [J]. Phys. Stat. Sol. (b) ,2002,229(3) :R1-R3.
  • 4Nanishi Y,Saito Y, Yamaguehi T. RF-Moleeular Beam Epitaxy Growth and Properties of InN and Related Alloys [J]. Jpn. J. Appl. Phys. , 2003,42:2 549-2559.
  • 5Vurgaftman I,Meyer J R,Ram-Mohan L R. Band parameters for Ⅲ- Ⅴ compound semiconductors and their alloys [J]. J. Appl. Phys. , 2001,89(11 ) : 5 815-5875.
  • 6Wu J ,Walukiewicz W,Shan W ,et al. Temperature dependence of the fundamental band gap of InN [J].J. Appl. Phys. ,2003,94(7) :4457-4460.
  • 7Wu J. When group-Ⅲ nitrides go infrared:New properties and perspectives [J]. J. Appl. Phys. , 2009,106(7): 011101-01-011101-28.
  • 8孔月婵,郑有炓.Ⅲ族氮化物异质结构二维电子气研究进展[J].物理学进展,2006,26(2):127-145. 被引量:9
  • 9Pala N,Rumyantsev S,Shur M,et al. Low frequency noise in AlGaN/InGaN/GaN double heterostructure field effect transistors [J]. Solid-State Electronics, 2003,47 : 1099-1104.
  • 10Lanford W, Kumar V,Schwindt R,et al. AlGaN/InGaN HEMTs for RF current collapse suppression [J]. Electron. Lett. , 2004,40(12) : 771-772.

二级参考文献103

  • 1孔月婵,郑有炓,周春红,邓永桢,顾书林,沈波,张荣,韩平,江若琏,施毅.AlGaN/GaN异质结构中极化与势垒层掺杂对二维电子气的影响[J].物理学报,2004,53(7):2320-2324. 被引量:12
  • 2Tsubouchi K, Sugai K, Mikoshiba N. IEEE Ultrason. Symp. 1981, 1: 375-380.
  • 3O'Clock G D, Duffy M T. Appl. Phys. Lett. 1973, 23(2): 55-56.
  • 4Jain S C, Willander M, Narayan J, et al. J. Appl. Phys. 2000, 87(3) : 965 -1006.
  • 5Zheng Z W, Shen B, Someya T, et al. Phys. Rev. B 62(12) : R7739-R7743.
  • 6Ibbetson J P, Fini P T, Ness K D, et al. Appl. Phys. Lett. 2000, 77(2) : 250-252.
  • 7Zhang Y, Smorchkova I P, Elsass C R, et al. J. Appl. Phys. 2000, 87(11) : 7981-7987
  • 8Wu Y F, Saxler A, Moore M. IEEE Electron Device Lett. 2004,25: 117-119.
  • 9Park S H, Chuang S L. J. Appl. Phys. 2000, 87(1): 353-364.
  • 10Ambacher O, Foutz B, Smart J, et al. J. Appl. Phys. 2000, 87(1): 334-344.

共引文献8

同被引文献41

引证文献7

二级引证文献12

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部