UBMS和PVAD法制备DLC薄膜表面微观形貌分析

Study on Surface Roughness of DLC Thin Films Deposited by UBMS and PVAD

光学薄膜的表面粗糙度是影响薄膜光学特性的重要因素，薄膜表面产生的散射损耗将影响薄膜的光学质量．采用非平衡磁控溅射（Unbalance Magnetron Sputtering，UBMS）和脉冲真空电弧沉积（Pulsed Vacuum Arc Deposition，PVAD）制备类金刚石薄膜（Diamond Like Carbon，DLC），利用泰勒霍普森表面轮廓仪，研究了不同工艺参数、不同薄膜厚度下所沉积的DLC薄膜表面粗糙度变化规律．结果表明：两种沉积技术下，随着薄膜厚度的增加，其表面均方根粗糙度先减小后增大．真空度和脉冲频率对表面粗糙度有显著影响．真空度在0．4～0．8Pa范围变化时，表面均方根粗糙度变化范围为0．8886～1．6104nm，脉冲频率在1～5Hz范围变化时，表面均方根粗糙度变化范围为1．0407～1．5458nm．

Surface roughness of optical film, which produces scattering loss, is one of important influencing factors to high quality optical thin films. DLC films are deposited by UBMS and PVAD,the surface roughness is measured with Taylor Hobson coherence correlation interferometer （Talysurf CCI2000）. We studied the regularity of the DLC films, which were deposited with different parameters and thickness. The results show that： Under the UBMS and PVAD, the surface roughness decreases and then increases with the increase of optical thin film thickness. Vacuum pressure and pulse frequency have greater impact on the film surface roughness. The range of surface roughness is 0. 888 6-1. 610 4 nm and 1. 040 7-1. 545 8 nm with the change of vacuum pressure（0. 4-0. 8 Pa） and pulse Frequency（1 -5 Hz）.