摘要
采用射频磁控溅射法在玻璃基片上成功制得了TbFeCo系列非晶垂直磁化膜,研究了溅射工艺对SmTbFeCo薄膜性能的影响。结果表明:溅射气压为0.5Pa、溅射功率为75W、厚度在100nm条件下所溅射形成的SmTbFeCo薄膜磁性最优。
SmTbFeCo magnetic thin fihns were prepared onto glass substrates by RF magnetron sputtering system. The effect of sputtering parameters on the magnet properties of thin films were investigated. It is found that the magnet properties of SmTbFeCo thin film is optimal when the sputtering pressure, sputtering power and thickness of the films are 0. 5Pa, 75W,100nm.
出处
《信息记录材料》
2010年第1期47-49,共3页
Information Recording Materials
