亚微米线条的微纳光纤笔直写技术研究

Direct Writing of Submicron Lines Using the Micro-and Nanofiber Pens

提出了一种利用微纳光纤笔(MNFP)直接写入亚微米线条的技术,利用微纳光纤笔在光刻胶表面接触式扫描,从而曝光产生亚微米线条。热熔拉伸和湿法刻蚀两步工艺相结合的新方法被用来制做微纳光纤笔。实验研究表明,直写分辨率可以达到稳定的200nm线宽。这一分辨率已经突破了曝光波长(442nm)的衍射极限。结果也显示了,通过改变光强,微纳光纤笔可以直写曝光出亚微米范围内宽度可变的线条。

A micro-and nanofiber pen（MNFP） direct writing technique for fabricating submicron lines is presented.Contact exposure is adopted during micro-and nanofiber pen scanning on the photoresist film.A two-step processs for fabricating the sharp and short MNFP is established by flamed-heated drawing and wet etching.The MNFP direct writing experiments are performed.The resolution of 200 nm line width is obtained,which is thinner than half of exposure wavelength（442 nm）.The experiment results also show that MNFP direct writing can provide various widths of line by changing the radiation power.