MOCVD—YBCO/Ag膜的显微组织

MICROSTRUCTURE OF MOCVD YBCo/Ag SUPERCONDUCTING FILMS

用ＸＲＤ、ＳＥＭ和ＥＤＳ研究了用三源分别蒸发和单溶液源超声雾化蒸发ＭＯＣＶＤ－ＹＢＣＯ／Ａｇ超导膜的显微组织和成分。两种工艺所制ＹＢＣＯ样品的ＴＣＯ为８８～９１Ｋ。静态沉积ＹＢＣＯ／Ａｇ膜的电流密度Ｊｃ高于动态沉积样品。其中单溶液源超声雾化ＭＯＣＶＤ－ＹＢＣＯ／Ａｇ膜的Ｉｃ和Ｊｃ最高达到３５８Ａ和２２×１０５Ａ／ｃｍ２（７７Ｋ，０Ｔ）。

This paper studies the micro structure and components of MOCVD-YBCo/Ag Superconducting films by XRD. SEM and EDS analysis. The superconducting films were prepared by separate vaporization of three sources or supersonic atomizing of single source solution. T Co of the YBCO samples prepared by the two techniques is in the range of 88～91K, J c of the YBCo/Ag films prepared by static MOCVD is higher than by dynamic MOCVD. The I c and J c of the MOCVD-YBCo/Ag films prepared by supersonic atomization of single solntion source are up to 3 58 A and 2 2×10 5 A/cm 2, respectively.