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石英晶体的条纹缺陷及其对透过率的影响 被引量:1

STRIA OBSERVATION AND ITS INFLUENCE ON TRANSMITTANCE IN QUARTZ CRYSTAL
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摘要 采用正交偏光条纹检测仪观察了水热法生长的光学石英晶体中的条纹缺陷,分析了光学石英晶体中条纹缺陷产生的原因和对晶体样品的透过率的影响。结果表明:晶体中的条纹缺陷主要是由在生长过程中籽晶中缺陷的遗传和高压釜中局部生长条件变化引起的。有条纹和无条纹缺陷晶体在400~800nm波段存在最高吸收峰,800~2500nm波段存在最低吸收峰。有条纹缺陷和无条纹缺陷晶体样品的透过率存在0.64%的差异。 The stria defects in optical quartz crystals grown by a hydrothermal method were observed by a crossed polarized light stripe detector.The root cause of the stria defects in quartz crystals and their effects on optical transmittance of the quartz crystal were analyzed.The results show that the stria defects formed in quartz crystals result from the stria defects in the seed and the variation of local growth conditions in the high pressure kettle such as temperature and pressure in the growth process.The transmittances of quartz samples with stria and without stripe were tested by spectrophotometer,and it was found that the lowest absorption peak is at 800-2500 nm-band and the maximum absorption peak exists at 400-800 nm-band,and the transmittances of these two samples also have 0.64% variance at this band.
出处 《硅酸盐学报》 EI CAS CSCD 北大核心 2010年第2期192-195,共4页 Journal of The Chinese Ceramic Society
关键词 石英晶体 条纹缺陷 透过率 籽晶 水热法 quartz crystal stria defect transmittance seed hydrothermal method
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参考文献4

  • 1ROBERT Laudise. Hydrothermal Synthesis of Crystals, 50 Years Progress in Crystal Growth [M]. New York: Elsevier, 2004: 185-191.
  • 2IWASAKI F, 1WASAKI H. Historical review of quartz crystal growth [J]. J Cryst Growth, 2002, 237-239(1): 820-827.
  • 3IWASAKI H, BALITSKY V S, BALITSKAYA L V, et al. Growth rates anisotropy of synthetic quartz crystals grown on Z-cut hexagonal seeds and computer simulations of growth process [J]. J Cryst Growth, 1998, 187(3/4): 481-489.
  • 4烁光特晶科技有限公司.GB/T7989-2008人造光学石英晶体[s].北京:中国标准出版社,2008.

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