电化学法制备单硅烷工艺概述

Preparation of Monosilane Using Electrochemical Methods

单硅烷(SiH4)作为一种提供硅组分的气体源,可用于制造多种高纯度晶体硅、非晶硅、氮化硅、氧化硅及金属硅化物,因其高纯度和能够实现精细控制而成为至今为止世界唯一大规模生产粒状高纯硅的中间产物。介绍了SiH4的物化性质及毒性。SiH4的工业合成方法包括硅化镁法、氯硅烷或烷氧基硅烷歧化法、氯硅烷还原法等,但它们存在工艺流程复杂、设备成本高、需要对产物进行复杂的精制等问题。详细介绍了几种国外公司开发的电化学合成SiH4的装置及工艺,该类方法具有操作安全和经济、可实现高度一体化、可现场发生、以及产物精制工艺简单等优点。

Monoailane（ Sill4 ）can be used to manufacture various high purity crystalline silicon, non-crystalline silicon, sili- con nitride, silicon oxides and metal silicides as a Si source gas. SiH4 become the unique medium product for large scale production of particulated high purity silicon due to its high purity and realizing accuracy control. The physical, chemical and toxic properties of SiH4 are introduced. The industrial synthesis methods included magnesium silicide method, ehlorosilanes or alkoxylsilanes disproportionating methods and chlorosilanes reduction methods and so on, but they have the drawhacks such as process complex,high equipment cost and product refinement complex and so on. The facility and process for electrochemical synthesis of SiH4 developed by several abroad companies are introduced in detail. The said methods have the advantages such as operation safety and economics, high integration, generation in situ and simply refinement process.