摘要
利用GCR-170型脉冲激光器Nd:YAG的三次谐波(355nm),以蓝宝石Al2O3(0001)为衬底,在不同温度下采用脉冲激光沉积法制备了ZnO薄膜.通过原子力显微镜、Raman谱、光致发光谱、红外透射谱、霍尔效应和表面粗糙度分析仪对制备的ZnO薄膜进行了测试.分析了在不同衬底温度下薄膜的表面形貌、光学特性,同时进行了薄膜结构和厚度的测试.研究表明:衬底温度对ZnO薄膜的表面形貌、光学特性、结构特性都是重要的工艺参量,尤其在500℃时沉积的ZnO薄膜致密均匀,并表现出较强的紫外发射峰.
ZnO thin films are deposited on sapphire （0001） substrates by a high-purity ZnO target and a pulsed Nd： YAG laser with a wavelength of 355 nm. The structural,optical and electrical properties of ZnO thin films are grown and investigated in various substrate temperatures. The morphological propertie of the films is analyzed by atomic force microscopy （AFM）. The optical properties and electrical properties of the films are investigated by Raman scattering and ultraviolet photoluminescence （PL） emission and FTIR Hall-effect measurements, respectively. The results of the temperature of the substrate is a highly important parameter to,influence the film morphology and films grown, and the high quality crystallinity has an excellent UV emission at 500 ℃.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2010年第2期296-300,共5页
Acta Photonica Sinica
基金
北京市教委基金(Km200910005019)
全国高等学校博士点基金(200800050013)资助
