硅油稀释PDMS法制备紫外纳米压印软模板

UV-NIL Soft Mold Fabricated by PDMS Diluted with Silicon Oil

软模板的制作是紫外纳米压印中关键的技术,模版的分辨率直接决定了压印图形的最小分辨率。使用具有高度均匀、100nm级孔洞阵列结构的多孔氧化铝作为母版,使用基于液态浇铸的硅油稀释聚二甲基硅氧烷(硅油和聚二甲基硅氧烷的质量比为1:2)法制备出具有规则点阵结构的软模板。通过SEM和AFM表征发现,特征图形得到了有效转移,特征尺度保持在100nm左右。相对于传统的模板制备方法,此方法成本低、流程简单、适合大规模生产,是一种非常有前途的软模板制备方法。

The fabrication of the soft mold is a critical technology for the realization of ultraviolet nanoimprint lithography （UV-NIL）. The ultimate resolution of the patterns fabricated with UV-NIL is primarily determined by the resolution of the features on the soft mold. The soft mold with regular dot arrays was fabricated through an improved mold fabrication process, using polydimethylsiloxane （PDMS） diluted by silicon oil as flexible mold materials （rn （silicon oil） ： rn（PDMS） = 1 ： 2）, and aluminum oxide templates with highly ordered 100 nm hole arrays as master molds. The SEM and AFM images show that the feature structures are transferred effectively, and the transferred feature scale remains about 100 nm. Compared with other traditional methods, the cost of this method is lower and the procedure is simpler, indicating that it has a promising future in mass production.