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微细光刻中部分相干系统成像研究 被引量:3

Study of Partical Coherent Imagery System in Microlithography
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摘要 分析了投影光刻系统中部分相干成像的过程,结果表明部分相干成像的像强是相干成像的像强对光源上每一点互相干强度的权重和。得出了近年来改进照明条件提高分辨力的物理本质:部分相干成像系统是一个空间频率可变的系统,频率的调制是通过照明函数的变化来实现的。提出了进一步提高光刻分辨力的新途径。 The physical process of partially coherent image formation in the projection lithography has been analyzed. It has been proved that the image intensity distribution in a partially coherent imagery system is the weighted sum of the intensities of the result from coherent imagery with respect to each point in the source. The physical mechanism of resolution enhancement by improving illumination condition has also been investigated. The results show that a partially coherent imaging system is practically a variable spatial frequency system. Frequency modulation can be realized by adjusting illumination function. New approach to resolution enhancement is given.
出处 《光学学报》 EI CAS CSCD 北大核心 1998年第12期1703-1710,共8页 Acta Optica Sinica
基金 中国科学院"九五"应用研究与发展重大项目
关键词 部分相干成像 二元光栅照明 光刻 微细光刻 partial coherent imagery, quadrupole illumination, annular illumination, binary grating illumination.
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  • 7古德曼.傅里叶光学导论[M].秦克诚,刘培森,陈家璧等译.第三版.北京:电子工业出版社,2006.143-145.
  • 8S. Saito, H. Inoue, H. Naganoet al.. High durable 4 kHz ArF excimer laser G42A for sub-90-nm lithography[C]. SPIE, 2004, 5377:1727-1734.
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