摘要
利用化学置换法在ｐ型Ｓｉ（１１１）表面制备了纳米微晶Ｐｄ，对其析氢反应催化活性进行了考察。采用阳极溶出法对沉积层进行了研究，并借助于Ｘ光电子能谱（ＸＰＳ）对表面和界面进行了分析，结果表明，表面沉积微晶Ｐｄ的ｐ型Ｓｉ电极在０．５ｍｏｌ／ＬＨ２ＳＯ４中的析氢过电位比裸Ｓｉ电极下降了近４５０ｍＶ；阳极溶出曲线在０．３６～０．３９Ｖ附近出现Ｐｄ的溶出峰；ＸＰＳ测试证明Ｐｄ沉积层呈不连续微晶弥散分布于基底表面，在Ｓｉ／Ｐｄ界面上形成了Ｐｄ的硅化物；ＸＲＤ分析结果证实Ｐｄ为纳米微晶结构。
Nanoscale microcrystal palladium/p -Si is prepared by means of chemical replacement, and its catalytic activity for hydrogen evolution reaction (HER) is investigated. Anodic stripping was made to characterized the deposit, and X-ray photoelectron spectroscopy (XPS) was used to analysis the surface and interface of Pd/Si system On the surface of p-Si deposited palladiunn microcrystal, the overpotential of HER dropped about 450 mV, compared to the etched p-type silicon. The amount of Pd deposited is related to both the etched time and dipping time, which can be demonstrated by the anodic stripping curve. XPS results showed that on the surface of silicon, Pd had formed in the form of discontinue film. The XPS signal of Pd located at 335.l eV, attributed to pure Pd 3d, and 3d, electron respectively, while for the interface of Si/Pd, double peaks was observed at 335.14 eV and 336.55 eV, attri- buted to the binding energy of pure Pd and silicide of Pd, which means that the first Pd layerdeposited had reacted with Si substrate and silicide of palladium forme.
基金
国家自然科学基金
