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共沉淀分离富集-电感耦合等离子体原子发射光谱法测定高纯氧化钨中痕量金属杂质 被引量:15

Simultaneous Determination of Trace Metal Impurities in High-Purity Tungsten Trioxide by Coprecipitation and Inductively Coupled Plasma-Atomic Emission Spectrometry
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摘要 提出了以La(OH)3为共沉淀剂,对高纯氧化钨中的痕量金属杂质元素经共沉淀预分离富集后进行ICP-AES测定的分析方法。探讨了影响杂质元素回收率和钨残留量的若干因素,确定了合适的分离富集条件。合成试样和标准样品的测试结果表明: Bi、Ca、Cd、Co、Cu、Fe、Mg、Mn、Ni、Pb、Sb、Sn、Ti等元素能被定量分离回收,回收率和精密度均令人满意。 Inductively coupled plasma-atomic emission spectrometry has been developed for the simultaneous determination of trace impurities in high-purity tungsten trioxide. Coprecipitation of these elements with Lanthanum hydroxide was used to separate and concentrate them from the tungsten matrix. Several factors which affect the recoveries of the elements and the residual amounts of tungsten have been discussed in detail. Synthetic sample and tungsten trioxide reference material were analyzed. The experiment shows that thirteen elements: Bi, Ca, Cd, Co, Cu, Fe, Mg, Mn, Ni, Pb, Sb, Sn and Ti can be quantitatively recovered and determind with satisfactory results.
出处 《分析化学》 SCIE EI CAS CSCD 北大核心 1998年第9期1097-1100,共4页 Chinese Journal of Analytical Chemistry
关键词 共沉淀 氧化钨 杂质 ICP AES 高纯氧化钨 测定 Coprecipitation separation concentration inductively coupled plasma-atomic emission spectrometry tungsten hydroxide metal impurity
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  • 1万家亮,光学与光谱技术,1985年,4期,61页
  • 2万家亮,华东师范大学学报,1985年,3期,59页

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