脉冲激光沉积LiMn_2O_4薄膜的研究

A Study of Pulsed Laser Deposition of LiMn 2O 4 Thin Films

在氧气氛下采用３５５ｎｍ脉冲激光烧蚀制备了ＬｉＭｎ２Ｏ４薄膜，并用四极质谱和发光光谱技术考察了脉冲激光烧蚀过程及环境氧气对薄膜沉积过程的影响．质谱测定结果表明，３５５ｎｍ激光烧蚀ＬｉＭｎ２Ｏ４的产物主要有Ｌｉ＋、Ｍｎ＋等离子和Ｏ２、Ｏ、ＬｉＯ２、ＬｉＭｎＯ、ＭｎＯ及锂原子的多聚体等中性产物．不同氧气压下测定的发光光谱表明烧蚀原子在环境氧气氛中存在氧化过程．用循环伏安法和Ｘ射线衍射法对薄膜进行了表征．

The LiMn 2O 4 films have been prepared by 355 nm pulsed laser deposition on the heated stainless steel substrate in an O 2 gas environment. The formation of the ablated species in the laser ablation process and the effect of O 2 ambient have been investigated by both quadrupole mass spectrometry and optical emission spectroscopy. The measured mass spectra show that the main ablation products are Mn +, Li +, O 2, O, LiO 2, LiMnO and lithium atomic cluster. The dependence of ambient O 2 pressure on the emission intensities of Mn containing species shows that the reactions of the ablated species with oxygen play an important role in the film deposition. The deposited LiMn 2O 4 films are characterized by XRD and cyclic voltammetry.