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光学元件激光预处理技术 被引量：5

Laser conditioning technology of optics
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摘要 国外学者用1064 nm激光对pickoff镜进行预处理,发现损伤阈值平均提高38.8%。国内研究者用CO2激光中度抛光后,熔石英基片的损伤阈值提到了30%左右,激光波长、扫描方式等对处理效果影响也比较明显。介绍了三种公认的预处理机制,将离线与在线处理方式做了简单地比较,并对国内外激光预处理技术的发展和前景进行了展望。 1064 nm laser is used by abroad researchers to condition pickoff mirror films,and obtained 38.8% increase for laser induced damage threshold（LIDT）.Domestic workers also find 30% increase for LIDT after CO2 laser conditioning on fused silica.Three kinds of mechanisms for laser conditioning are also introduced.A brief comparison is made between the off-line and on-line conditioning technologies.Finally,the future development is introduced for the domestic and abroad laser conditioning technologies.
作者 陈猛 袁晓东 吕海兵 王成程 向霞 祖小涛
机构地区 中国工程物理研究院激光聚变研究中心 电子科技大学物理电子学院
出处 《光学技术》 CAS CSCD 北大核心 2010年第1期79-83,共5页 Optical Technique
基金 国家863项目课题 电子科技大学青年基金重点资助项目(L08010401JX0806)
关键词 激光技术 激光预处理 激光损伤阈值 预处理机制 laser technology laser conditioning LIDT conditioning mechanism
分类号 TN249 [电子电信—物理电子学]
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参考文献22

  • 1Norton M A, Adams J J, Carr C W, et al. Growth of laser damage in fused silica: Diameter to depth ratio[C]. SPIE, Boulder, CO, United States, 2008(6720).
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二级参考文献18

  • 1解亚平,孙志红,成泽,陈波,景峰.光学元件损伤在线检测中的图像处理[J].强激光与粒子束,2006,18(7):1085-1089. 被引量：11
  • 2Brusasco R M,Penetrante B M,Butler J Aet al..Localized CO2 Laser treatment for mitigation of 3ω damage growth in fusedsilica[C].Boulder Damage Symposium on Optical Materials ,2001,UCRL-JC-144297
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  • 8Hrubesh L W,Norton M A,Molander W A et al..Methods for mitigating growth oflaser-initiated surface damage on fused silcia optics at 351nm [C].Boulder Symposium onLaser Optical Materials for High Power Lasers,2001 ,URCL-JC-144295
  • 9Brusasco R M,Penetrante B M,Buffer J A et al..CO2-Laser polishing for reduction of351-nm surface damage initiation in fused silica [C].Laser-Induced Damage in OpticalMaterials,2001,UCRL-JC-144293
  • 10Temple P A.An improved dark-field-like surface inspection technique using totalinternal reflection.Presented at conference on optics[C],79,23～25 May 1979,LosAlamos,New Mexico

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光学技术
2010年 第1期

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