摘要
用化学池沉积方法(CBD)制备了CdS多晶薄膜,并对薄膜进行了退火处理,测量了不同CdS薄膜光电导、暗电导和电导-温度关系,计算了电导激活能。结果表明:刚沉积的CdS暗电导率为10-6Ω-1·cm-1,比光电导率低二个数量级,退火后,电导升高,电导激活能减小。X射线衍射分析表明,经退火后,CdS薄膜发生相变,由立方结构变成六方结构。对上述结果进行了讨论。
Cadmium sulphide (CdS) polycrystalline films are prepared by chemical bath deposition (CBD) technique followed by annealing treatment.The photo- and dark-conductivity of the films are measured along with the dependence of dark-conductivity on temperature.The activation energy is calculated.The result shows that the dark-conductivity for as-deposited samples is 10 -6 Ω -1 ·cm -1 which is two orders of magnitude lower than the photo-conductivity. The conductivity increases while the activation energy decreases after annealing.It is shown by X ray diffraction (XRD) that the phase of CdS films changes from cubic to hexagonal due to annealing.Discussion on these results is given.
出处
《半导体光电》
CAS
CSCD
北大核心
1998年第6期404-406,411,共4页
Semiconductor Optoelectronics
基金
国家"九五攻关"资助
关键词
退火
电导率
激活能
硫化镉
多晶薄膜
CdS Film, Annealing, Conductivity, Activation Energy