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稀有气体-卤素准分子光源的最新进展 被引量：1

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摘要 对准分子光源的一般性质进行了介绍,并概述了5种最具应用前景的稀有气体-卤素准分子光源的最新研究进展。目前获得的最佳紫外辐射效率为:溴化氪(KrBr*)207nm,2.4%;氯化氪(KrCl*)222nm,15%;氯化氙(XeCl*)308nm,11%;碘化氙(XeI*)253nm,2%;溴化氙(XeBr*)282nm,10.5%.
作者 庄晓波 朱绍龙 张善端
机构地区 复旦大学电光源研究所
出处 《光源与照明》 2010年第1期18-21,共4页 Lamps & Lighting
关键词 准分子灯 介质阻挡放电(DBD) 紫外辐射效率
分类号 TM923.32 [电气工程—电力电子与电力传动]
  • 相关文献

参考文献23

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  • 2l-Iozumi A, Masuda T, Hayashi K, et al. Spatially defined surface modification of poly (methyl methacrylate) using 172 nm vacuum ultraviolet light [J]. Langmuir, 2002, 18: 9022 - 9027.
  • 3Neiger M. Dielectric barrier discharges: An unusual new light source [A]. 6th Int Symp on the science & technology of Light Sources (LS-6) [C]. Budapest, Hungary: 1992.75-82.
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  • 7Avdeev S M, Sosnin E A, Tarasenko V F. Optical characteristics of plasma of I2*, Cl2*, Br2* halogen dimmer barrier-discharge excilamps [J]. Opt Spectrosc, 2007, 103 (4): 526-532.
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同被引文献34

  • 1徐金州,梁荣庆,任兆杏.UV Emission of Excimer XeCl Excited in Dielectric Barrier Discharge by using Pulse Power Supply[J].Plasma Science and Technology,2001,3(5):933-940. 被引量：2
  • 2Kogelschatz U. Dielectric-barrier discharges: Their history, dischargephysics, and industrial applications [J]. Plasma Chemistryand Plasma Processing, 2003, 23 (1): 1-46.
  • 3韩秋漪, 张善端. 光化学合成维生素D [C] //2 0 1 1 四直辖市照明科技论坛论文集. 2 0 1 1 :天津, 305-309.
  • 4Rhodes CK. Excimer Lasers [M]. Berlin, Germany: Springer-Verlag, 1984: 47-138.
  • 5Kompa K L, Walther H, High-power Lasers and Applications[M]. Berlin, Germany: Springer-Verlag, 1978: 3-56.
  • 6Gellert B, Kogelschatz U. Generation of excimer emission indielectric barrier discharge [J]. Applied Physics B, 1991,52:14-21.
  • 7Avdeev SM , SosninEA, Tarasenko V F. Optical characteristicsof plasma of 12*, Cl2*, Br2* halogen dimer barrier-dischargeexcilamps [J]. Optics and Spectroscopy, 2007, 103 (4): 526-532.
  • 8Wilkinson P G, Tanaka Y. New Xenon-light source for thevacuumultraviolet [J]. Journal of the Optical Society of America,1955, 45 (5): 344-349.
  • 9Hozumi A, Masuda T, Hayashi K, et al. Spatially definedsurface modification of poly (methyl methacrylate) using 172nm vacuum ultraviolet light [J]. Langmuir, 2002, 18: 9022-9027.
  • 10Neiger M. Dielectric barrier discharges: An unusual new lightsource [C] // Proceedings of the 6th International Symposium on the Science and Technology of Light Sources (LS-6). Budapest,Hungary: 1992: 75-82.

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光源与照明
2010年 第1期

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