期刊文献+

纳米晶体Ti表面磁控溅射CN_x/SiC双层薄膜的干摩擦磨损性能 被引量:7

Dry Friction/Wear Behavior of Magnetron Sputtered CN_x/SiC Bilayered Films on Nanocrystal Ti Substrates
下载PDF
导出
摘要 采用室温磁控溅射技术在纳米晶体钛表面制备出CNx/SiC双层薄膜,SiC为中间层。研究了CNx薄膜的纳米压痕行为和摩擦磨损性能。试验结果表明:CNx薄膜的纳米硬度、杨氏弹性模量、硬度与弹性模量比值分别为8.03GPa,55.0GPa和0.146;在200g载荷、氮化硅球(半径为2mm)为对摩件、大气干摩擦条件下,CNx薄膜的磨损速率为10-6mm3m-1N-1级,摩擦系数约为0.159,磨损后薄膜未出现裂纹和剥落。分析表明,摩擦系数和摩擦化学有关,良好的抗磨性能和硬度与弹性模量比值较之是相一致的。 The mechanical properties of the CNx/SiC bilayered coatings, deposited by magnetron sputtering at room temperature on nanocrystal Ti substrates, were studied. The results show that the CNx film has a nano-hardness of 8.03GPa,a Young modulus of 55.0GPa, and a hardness-to-modulus ratio of 0.146. When sliding against silicon nitride ball, 2mm in diameter, under ambient environment at a load of 200g, the friction coefficient of the CNx film was found to be 0.159, with a specific wear rate up to the magnitude of 10^-6 mm3m^- 1N^- 1, while without observable cracking or peeling off. Possible mechanism was tentatively discussed.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2010年第2期201-204,共4页 Chinese Journal of Vacuum Science and Technology
基金 江苏大学优秀学术青年骨干培养对象基金 江苏省摩擦学重点实验室基金资助项目(kjsmcx06005)
关键词 钛基材 薄膜 纳米压痕 摩擦磨损 磁控溅射 Titanium substrate, Thin films, Nano-indentation, Friction and wear, Magnetron sputtering
  • 相关文献

参考文献14

  • 1Xu Xiaojing, Shao Honghong, Gao Jianchang, et al. Materials Science and Engineering[ J], 2008,493 ( 1 - 2) : 195 - 201.
  • 2李合琴,何晓雄,王淑占,巫邵波,赵之明.掺氮类金刚石薄膜的显微结构和光谱学研究[J].真空科学与技术学报,2008,28(3):225-229. 被引量:12
  • 3Kato K, Umehara N, Adachi K. Wear [ J ], 2003,254 ( 11 ) : 1062- 1069.
  • 4Park Y S,Sik M H,Geon H J, et al. Thin Solid Films[J], 2005,475 : 298 - 302.
  • 5Voevodin A A, Jones J G, Back T C, et al. Surface and Coatings Technology[ J], 2005,197 : 116 - 125.
  • 6Zhou F, Wang X L, Adachi K, et al. Surface and Coatings Technology [ J], 2008,202 (15) : 3519 - 3528.
  • 7Zhou F, Wang X L, Kato K, et al. Wear [ J ], 2007,263 (7 - 12) : 1253 - 1258.
  • 8Fernandez-Palacio J,Arce-Garcia I,Bull S J. Tribology International[ J], 2004,37 : 929 - 940.
  • 9Kulikovsky V, Vorli C ek V, Boha C P, et al. Surface and Coatings Technology [ J],2008,202 (9) : 1738 - 1745.
  • 10Costa A K, Camargo S S, Achete C A, et al. Thin Solid Films [ J], 2000,377 - 378 : 243 - 248.

二级参考文献20

  • 1高鹏,徐军,朴勇,丁万煜,邓新绿,王德和,董闯.溅射靶功率对氮化碳薄膜结构的影响[J].真空科学与技术学报,2005,25(5):350-354. 被引量:3
  • 2毕凯,刘军,陈春.氮化碳薄膜的红外光谱(FTIR)特性分析[J].矿冶工程,2006,26(3):81-83. 被引量:3
  • 3Liu A M, Cohen M L. Science, 1989,245 : 841 - 842.
  • 4Zheng W T. Sjpstrom H, Ivnaov I, et al. J. Vac. Sci. Technol., 1996, A14:2696- 2701.
  • 5Ohta R,Lee K H,Saito N,et al. Thin Solid Film,2003,434: 296 - 302.
  • 6Wixton M R.J. Am. Ceram. Soc, 1990,73 (7):1973 - 1978.
  • 7Taki Y, Kitagawa T, Takai O. Thin Solid Films, 1997,304: 183- 190.
  • 8Ronning C, Feldermann H, Merk R, et al. Phys. Rev. B, 1998,58(4) : 2207 - 2215.
  • 9Marton D, Boyd K J, Al-Bayati A H, et al. Phys. Rev. Lett, 1994,73(1) : 118.
  • 10Cheng Yuhang, Qiao Xuehang, Chen Jianguo, et al. Diamond & Related Materials,2002,11(8):1511- 1517.

共引文献11

同被引文献78

引证文献7

二级引证文献34

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部