含三氟甲基聚硅烷的合成及其紫外光降解

Synthesis and UV Degradability of Polysilane with Trifluoromethyl Group

用Wurtz法合成了聚甲基苯基硅烷、聚(对三氟甲基苯基)(甲基)-甲基苯基硅烷以及聚(对三氟甲基苯基)(苯基)-甲基苯基硅烷3种聚硅烷。用IR、GPC和荧光光谱对产物进行表征,并研究了其紫外光降解性能。从电子结构角度解释了不同聚硅烷在荧光以及紫外光降解行为方面的差异。结果表明,在苯环对位引入吸电子基团三氟甲基有利于紫外光降解的进行,而苯环的增多则会阻碍紫外光降解。

Polymethylphenylsilane,poly（p-trifluoromethylphenyl）（methyl）-（methylphenyl）silane and poly（p-trifluoromethylphenyl）（phenyl）-（methylphenyl）silane were synthesized through the Wurtz reaction.The polysilanes were characterized by IR,GPC and fluorescence spectroscopy,and their UV degradability was investigated.The difference of the polysilanes in photoluminescence and UV degra-（dability） was explained on basis of electronic structures.Results show that the introduction of electron-withdrawing groups —CF_3 at the para-position of phenyl ring is favored to UV degradation of polysilanes.UV degradation of polysilanes is inhibited with the increasing content of phenyl rings.