摘要
用原子力显微镜对粗糙硅表面进行了形貌测量，发现其高度分布的各向异性，根据光场分布特点，结合晶片样品表面的散射方位曲线，在入射角是75°的情况下，沿着散射方位曲线测量了样品表面的光散射轮廓，引入自仿射分形随机表面模型，利用傅立叶变换法对光的散射轮廓进行定量分析，成功提取了随机表面参量，并与在原子力显微镜下测量样品表面高度分布经计算所得的数据相比较，验证所得参量的正确性．
The morphology of sample wafer is studied with atomic force microscope and it is found that the sample is anisotropy random surface. For the characterization of distribution of diffraction from anisotropy rough surface , by combining the scattering curve of the sample surface, the scattering profile of light intensity of the sample surface along the scattering curve is measured when the incident angle is 75°in the experiment. The scattering profiles of light intensity quantificationally using self--affine fractal surface model and inverse Fourier transformation are analyzed, and parameters of anisotropy surface are determinated. Comparing with the data obtained from AFM. We verify that parameters are correct.
出处
《山东师范大学学报（自然科学版）》
CAS
2010年第1期64-66,共3页
Journal of Shandong Normal University(Natural Science)
基金
国家自然科学基金资助项目（1674085）.
关键词
散射方位曲线
实验测量
光散射轮廓
傅立叶变换
scattering curve
experimental measurement
scattering profile of light intensity
Fourier transformation
