摘要
采用射频磁控溅射法在(001)SrTiO3基片上制备了SrRuO3薄膜,采用X射线衍射(XRD)、原子力显微镜(AFM)、四探针测试仪等分析方法系统研究了沉积温度对SrRuO3薄膜结构、表面形貌及输运性质的影响。实验结果表明:当生长温度低于550℃时,SrRuO3薄膜为多晶结构;当温度在550~650℃范围内变化时,SrRuO3薄膜可以在SrTiO3基片上外延生长,薄膜的最低电阻率约为0.5mΩ.cm。
SrRuO3 thin film was fabricated on (001) SrTiO3 substrate by RF magnetron sputtering method.Influences of deposition temperature on the structural and physical properties of SrRuO3 thin film were studied using X-ray diffraction (XRD),atomic force microscope (AFM) and four-probe tester.It was found that SrRuO3 thin film is polycrystalline when the deposition temperature is lower than 550 ℃,it is epitaxially grown on SrTiO3 substrate when the growth temperature ranges from 550 to 650 ℃,and the minimum resistivity of the SrRuO3 film is about 0.5 mΩ·cm.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2010年第1期135-138,148,共5页
Journal of Synthetic Crystals
基金
国家自然科学基金(No.60876055)
河北省自然科学基金项目(E2008000620)
教育部科学技术研究重点项目(No.207013)
河北省应用基础研究计划重点基础研究项目(08965124D)