沉积温度对磁控溅射生长SrRuO_3薄膜结构和性能的影响

Effect of Deposition Temperature on the Structural and Physical Properties of SrRuO_3 Films Fabricated by Magnetron Sputtering

采用射频磁控溅射法在(001)SrTiO3基片上制备了SrRuO3薄膜,采用X射线衍射(XRD)、原子力显微镜(AFM)、四探针测试仪等分析方法系统研究了沉积温度对SrRuO3薄膜结构、表面形貌及输运性质的影响。实验结果表明:当生长温度低于550℃时,SrRuO3薄膜为多晶结构;当温度在550～650℃范围内变化时,SrRuO3薄膜可以在SrTiO3基片上外延生长,薄膜的最低电阻率约为0.5mΩ.cm。

SrRuO3 thin film was fabricated on （001） SrTiO3 substrate by RF magnetron sputtering method.Influences of deposition temperature on the structural and physical properties of SrRuO3 thin film were studied using X-ray diffraction （XRD）,atomic force microscope （AFM） and four-probe tester.It was found that SrRuO3 thin film is polycrystalline when the deposition temperature is lower than 550 ℃,it is epitaxially grown on SrTiO3 substrate when the growth temperature ranges from 550 to 650 ℃,and the minimum resistivity of the SrRuO3 film is about 0.5 mΩ·cm.