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电刷镀铬工艺和添加剂对镀液及镀层性能影响研究 被引量:3

Effect of Chromium Additive and Brush Plating Process on the Properties of the Plating Solution and Coating
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摘要 针对电刷镀铬时电流效率低、沉积速度慢、铬层光亮度差的实际,研究了电刷镀铬的工艺参数如电流密度、铬酐浓度、温度和向基础镀液中加入添加剂对其的影响。结果表明:电流密度取I=200A/dm2,铬酐浓度取250g/L,温度在25~28℃时,电流效率、沉积速度大,而且镀层的光亮度好。单一添加剂中,能明显提高电刷镀铬电流效率的是:碘化钾、甲醛、三氯乙酸,能明显提高沉积速度的是:碘化钾、三氯乙酸,能明显改善光亮度的是:三氯乙酸、甲醛、甲酰胺。 Process parameters, i. e., the current density, chromic anhydride concentration, temperature and the additive agent, were studied to solve the low currency efficiency and low deposition rate, poor lightness in chromium brush plating. The results show that the good currency efficiency and deposition rate and bright coating can be obtained when the temperature is between 25 ℃ and 28 ℃, the current density is 200 A/dm^2, and the chromic anhydride is 250 g/L. As a single additive, i. e, potassium iodide, formalin, and trichloroacetic acid, can progressively improve the current efficiency, while potassium iodide and trichloroacetic acid improve the deposition rate and trichloroacetic acid, formalin and formylamine upgrade the brightness.
出处 《铸造技术》 CAS 北大核心 2010年第3期355-358,共4页 Foundry Technology
关键词 电刷镀铬 添加剂 电流效率 沉积速度 光亮度 Chromium brush plating Additive agent Current efficiency Deposition rate Lightness
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