含硅聚氨酯的制备及其硅元素的特征分布

Preparation of Silicon-Based Polyurethanes and Character Distribution of Its Silicon

将α,ω-二-(4-羟基丁基)聚二甲基硅氧烷(HB-PDMS)和端羟基聚己二酸乙二醇酯同时与2,4-甲苯二异氰酸酯通过溶液聚合法反应生成含硅的聚氨酯,研究了退火工艺对自组织结构的影响。结果表明,在退火条件下膜可以形成自组织结构。光电子能谱分析进一步说明了硅向表面迁移。

Silicon-based polyurethane was prepared by using poly （ethylene-glycol-adi-pate） diols and α,ω-bis （4-hydroxybutyl） polydimethylsiloxane （HB-PDMS）, 2,4-tolylene diisocyanate, and the effects of annealing process on self-organization were studied. The results show that under annealing process, films can self-organize to material. The results of XPS show that silicon moves to surface.