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电弧源掺入Al、B离子改性TiN涂层性能的研究

Research on the properties of TiN coatings modified by arc source with addition of Al and B ions
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摘要 采用AlB12+2%AlB10电弧靶与Ti靶中频磁控溅射共沉积的工艺,在高速钢基体上形成Ti-Al-B-N多元复合涂层。电子扫描电镜(SEM)、X射线衍射(XRD)分析结果表明:涂层由TiN的柱状结构转变为TiA1BN的多层混合结构,组织更为致密均匀;通过调节电弧电流,增加Al、B元素剂量,涂层晶面取向生长增多,并逐渐出现新相。涂层的显微硬度和耐磨性测试表明,随膜层中Al、B成分的增加,膜层维氏硬度增大,耐磨性能提高。 Ti-Al-B-N compound coatings were deposited on polished surface of high speed steel by arc ion plating together with intermediate frequency unbalanced magnetron sputtering.The analysis results of SEM and XRD indicate that the size of droplets on the surface of TiA1BN is smaller than that on the TiN films,the defects are eliminated on a large scale,and the microstructure of the surface is more compact and uniform.The lattice distortion of TiN films is caused by the addition of Al,B element,and the new phase appeares.Its surface hardness and wear resistance are also improved obviously.
出处 《兵器材料科学与工程》 CAS CSCD 2010年第2期35-37,共3页 Ordnance Material Science and Engineering
关键词 电弧源 中频磁控溅射TiAlBN涂层 TIN涂层 共沉积 arc ion plating intermediate frequency unbalanced magnetron sputtering TiA1BN films TiN films together deposition
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