摘要
目的建立体外检测光敏物质的模型方法采用组氨酸光氧化试验检测了吡哌酸和诺氟沙星引起的光敏反应.并观察了 UVA 剂量和药物浓度对光敏反应强度的影响结果经不同剂量 UVA照射后,吡哌酸和诺氟沙星药品溶液中的组氨酸浓度有不同程度的降低。不同浓度药物致组氨酸光氧化反应程度间有显著性差异(P<0.01);不同剂量 UVA 致组氨酸光氧化反应程度间有显著性差异(P<0.01) 结论吡哌酸和诺氟沙星均引起组氨酸光氧化分解,UVA 剂量增加和药物浓度增加都导致光敏反应增强。
Objective To establish a model for assessment of photosensitizing agents in vitrO.Methods Hislidine photooxidation method was employed.Histidine was irradiated wilh UVA in the presence of pipemidic acid and norfloxacin.Then the remaining histidine was assessed Pauly reaction.Results Histidine concenlration in pipemidic acid solution and norfloxacin solution decrdased after UVA irradiation The photodegradation rate of histidine increased with the increase of UVA dosage and drug concenlration.Conclusion Both pipemidie acid and norfloxacin cause photoxidation of histidine.
出处
《中华皮肤科杂志》
CAS
CSCD
北大核心
1998年第6期366-367,共2页
Chinese Journal of Dermatology
基金
卫生部科研基金资助课题
