Effects of Annealing Temperature on Structural and Optical Properties of ZnO Thin Films

退火的效果大音阶的第五音胶化纺纱涂层在 Si (100 ) 底层上种的 ZnO 电影的结构、光的性质上的温度被调查。结构、光的性质被 X 光衍射描绘，扫描电子显微镜学和光致发光系列。X 光检查衍射分析证明 ZnO 电影的水晶质量在在高温度退火以后变得更好。谷物尺寸增加，温度增加。在 ZnO 电影的飞机的张力的压力首先增加然后减少，退火的温度增加，这被发现，到达在 700 牴扩瑵摥琠? 桴 ? 楤晦牥湥散椠 ? 湩牴湩楳? 牰灯牥楴獥漠 ? 桴 ? 睴? ?獢牴瑡獥的 1.8 GPa 的最大的价值。

The effects of annealing temperature on the structural and optical properties of ZnO films grown on Si （100） substrates by sol-gel spin-coating are investigated. The structural and optical properties are characterized by x-ray diffraction, scanning electron microscopy and photoluminescence spectra. X-ray diffraction analysis shows the crystal quality of ZnO films becomes better after annealing at high temperature. The grain size increases with the temperature increasing. It is found that the tensile stress in the plane of ZnO films first increases and then decreases with the annealing temperature increasing, reaching the maximum value of 1.8 GPa at 700℃. PL spectra of ZnO films annealed at various temperatures consists of a near band edge emission around 380 nm and visible emissions due to the electronic defects, which are related to deep level emissions, such as oxide antisite （OZn）, interstitial oxygen （Oi）, interstitial zinc （Zni） and zinc vacancy （VZn^-）, which are generated during annealing process. The evolution of defects is analyzed by PL spectra based on the energy of the electronic transitions.