半导体光催化剂的表面修饰

Surface Modification of Semiconductor Photocatalyst

从半导体光催化剂表面修饰的类型、机理及效果出发，对其研究进展作了综合评述．

The progresses in the surface modification of semiconductor photocatalyst, concerning the types, mechanisms and effects, are reviewed. The modification methods are followed into: (1) dye sensitization, (2) composite of semiconductors, (3) metal deposition and (4) ions modifying. They are compared, and the improvements are proposed.